Toshiba develops molecular photoresist technology for EUV lithography
Tuesday, November 17, 2009 - 16:42
in Physics & Chemistry
Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology.