Toshiba, AIST Develop Mask Pattern Optimizing Technology That Extends Life of Optical Lithography
Monday, February 15, 2010 - 10:42
in Physics & Chemistry
Toshiba and Japan's National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that improves the accuracy of lithography for LSIs by approximately 20%. The technology opens the door to extending the life of current ArF immersion lithography to the next generation and beyond.