More precise method of nanopatterning
Thursday, August 4, 2011 - 06:00
in Physics & Chemistry
A nanoimprint method has already been achieved in nanopatterning with a high resolution using negative type photoresist, Kosei Ueno tells PhysOrg.com. Ueno is a scientist at Hokkaido University in Sapporo, Japan, and associated with PRESTO. However, some problems remain with the negative type photoresist.