Nanoscientists invent better etching technique
Friday, August 19, 2011 - 07:31
in Physics & Chemistry
(PhysOrg.com) -- Imagine yourself nano-sized, standing on the edge of a soon-to-be computer chip. Down shoots a beam of electrons, carving precise topography that is then etched the depth of the Grand Canyon into the chip. From the perspective of scientists at the U.S. Department of Energys Argonne National Laboratory, this improved form of etching could open the door to new technologies.