Controlling silicon evaporation allows scientists to boost graphene quality
Thursday, September 22, 2011 - 18:00
in Physics & Chemistry
Scientists from the Georgia Institute of Technology have for the first time provided details of their "confinement controlled sublimation" technique for growing high-quality layers of epitaxial graphene on silicon carbide wafers. The technique relies on controlling the vapor pressure of gas-phase silicon in the high-temperature furnace used for fabricating the material.