Physicist accelerates simulations of thin film growth

Tuesday, May 17, 2011 - 14:30 in Physics & Chemistry

A researcher has implemented a new mathematical approach to accelerate complex calculations used to simulate micro-thin material formation. He studies the modeling and growth of materials at the atomic level. He leverages Ohio Supercomputer Center resources and Kinetic Monte Carlo methods to simulate the molecular beam epitaxy process, where metals are heated into a gaseous state and then reform as thin films.

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