Making Wafers Faster by Making Features Smaller
Tuesday, December 14, 2010 - 09:31
in Physics & Chemistry
Manufacturing semiconductors for electronics involves etching small features onto wafers using lasers, a process that is limited by the wavelength of the light itself. The development of a new, intense 13.5-nm light source will resolve this issue by reducing the feature size by an order of magnitude or so, according to Purdue researchers writing in the Journal of Applied Physics.