Ultraviolet Light to the Extreme

When you heat a tiny droplet of liquid tin with a laser, plasma forms on the surface of the droplet and produces extreme ultraviolet (EUV) light, which has a higher frequency and greater energy than normal ultraviolet. Now, for the first time, researchers have mapped this EUV emission and developed a theoretical model that explains how the emission depends on the three-dimensional shape of the plasma. In doing so, they found a previously untapped source of EUV light, which could be useful for various applications including semiconductor lithography, the process used to make integrated circuits.

Read the whole article on Newswise - Scinews

More from Newswise - Scinews